Nuclear thin film targets play a crucial role in experimental nuclear physics, serving as essential components in a wide range of research including reaction cross-section measurements, decay studies, and ion beam experiments. The preparation of these targets demands high precision in thickness, uniformity, and elemental purity to ensure reliable and reproducible results. Several fabrication techniques are employed based on the physical and chemical properties of the target material and the specific requirements of the experiment. Common methods include vacuum evaporation, sputtering, electrodeposition, and rolling. Vacuum evaporation and sputtering are widely used for producing high-purity, uniform films, especially for metals and refractory materials. Electrodeposition is preferred for plating thin layers of isotopically enriched materials, often onto backing foils. Rolling is typically applied to ductile materials requiring thicker targets. Each method presents unique advantages and challenges in terms of material wastage, film adhesion, target thickness control, and backing compatibility. The continued development and refinement of target-making techniques are vital for advancing nuclear research, particularly in high-precision measurements, radioactive ion beam applications, and target longevity under high-intensity beam exposure. As nuclear science progresses into more demanding experimental regimes, innovations in thin film target fabrication remain a foundational element of successful experimentation.